提出了一種制備納米量級(jí)鐵電聚合物PVDF/PDDA超薄膜的新方法。聚二烯丙基二甲基氯化銨(PDDA)和極化處理后的聚偏氟乙烯(PVDF)復(fù)合超薄膜是通過(guò)層與層的靜電自組裝(LbL-SA)方法制備的，厚度約30～150 nm，每層膜厚度約為9 nm。PVDF/PDDA多層膜通過(guò)石英晶振微天平(QCM)、紅外頻譜儀、原子力顯微鏡(AFM)進(jìn)行了測(cè)試與表征。QCM表征結(jié)果表明，PVDF與PDDA超薄膜能較好地交替組裝；AFM表明PVDF/PDDA聚合物超薄膜的表面均勻、薄膜致密。與PVDF厚膜的電阻性能相比，PVDF/PDDA復(fù)合超薄膜的電阻性能有了很大提高。
關(guān) 鍵 詞 鐵電聚合物; PVDF/PDDA; 自組裝; 超薄膜

Abstract A novel method for the production of nanoscale polymeric multilayer films of ferroelectric PVDF/PDDA is presented. The ultrathin multilayer film of poly (diallyldimethylammonium chloride) (PDDA) and polyvinylidene fluoride (PVDF) has been prepared by the layer-by-layer static self-assembly (LbL-SA) method. The PVDF/PDDA multilayer film with the thickness ranging from about 30nm to 150 nm (the thickness of each layer is about 9nm.) is characterized by quartz crystal microbalance (QCM), atomic force microscope (AFM), X-ray diffraction (XRD), and infrared spectra (IR). The QCM reveals that the alternate ultrathin films of PVDF and PDDA are well orderly assembled. AFM results indicate that PVDF/PDDA polymeric multilayer film with high uniformity has been obtained. Compared with PVDF thick film, resistivity of PVDF/PDDA ultrathin film is dramatically enhanced.
Key words ferroelectric polymer; PVDF/PDDA; self-assembly; ultrathin films